The 65h JSAP Spring Meeting, 2018

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15 Crystal Engineering » 15.4 III-V-group nitride crystals

[18p-E202-1~22] 15.4 III-V-group nitride crystals

Sun. Mar 18, 2018 1:15 PM - 7:30 PM E202 (57-202)

Tsutomu Araki(Ritsumeikan Univ.), Ryuji Katayama(Osaka Univ.), Hajime Fujikura(SCIOCS)

6:30 PM - 6:45 PM

[18p-E202-19] Growth of AlGaN films with high Al mole fractions by pulsed sputtering

〇Yuya Sakurai1, Kohei Ueno1, Atsushi Kobayashi1, Hiroshi Fujioka1,2 (1.IIS, the Univ. of Tokyo, 2.JST-ACCEL)

Keywords:AlGaN, sputtering