The 65h JSAP Spring Meeting, 2018

Presentation information

Oral presentation

15 Crystal Engineering » 15.4 III-V-group nitride crystals

[18p-E202-1~22] 15.4 III-V-group nitride crystals

Sun. Mar 18, 2018 1:15 PM - 7:30 PM E202 (57-202)

Tsutomu Araki(Ritsumeikan Univ.), Ryuji Katayama(Osaka Univ.), Hajime Fujikura(SCIOCS)

7:15 PM - 7:30 PM

[18p-E202-22] Growth of GaN on (0001) Sapphire Substrates Using h-BN Buffer Layer by MBE

Yasuyuki Kobayashi1, Keiichi Nakata1, Hideki Nakazawa1, Hiroshi Okamoto1, Masanobu Hiroki2, Kazuhide Kumakura2 (1.Hirosaki Univ., 2.NTT BRL)

Keywords:boron nitride, molecular beam epitaxy

We grew GaN thin films on (0001) sapphire substrates using h-BN buffer layer. Intensity of (0002) GaN in X-ray diffraction decreses as the thickness of h-BN buffer layer increases.