[20a-A402-1~11] 3.9 Terahertz technologies

△ [20a-A402-10] Fabrication of Moth-Eye THz Anti-Reflection Structures by Femtosecond Laser Processing

〇Haruyuki Sakurai¹, Natsuki Nemoto¹, Kuniaki Konishi¹, Yuki Sakurai², Nobuhiko Katayama², Tomotake Matsumura², Junji Yumoto¹, Makoto Kuwata-Gonokami¹ (1.The Univ. of Tokyo, 2.Kavli IPMU)

Keywords:terahertz, laser processing, Anti-reflection coating

With the advancement of high-power and high-sensitivity THz applications, the reduction of reflection losses has become a critical issue. In this work, we use femtosecond laser processing to fabricate moth-eye anti-reflection structures on the surface of high-resistivity silicon, and measure broadband decrease of reflection. We also demonstrate an application of such structured silicon plates as THz output couplers for LiNbO₃ crystals.