[20a-C102-1~12] 6.3 Oxide electronics

△ [20a-C102-5] Control of the Metal–Insulator Transition in VO₂ Thin Films by K Deposition

〇Daisuke Shiga^1,2, Makoto Minohara², Miho Kitamura², Ryu Yukawa², Taichi Mitsuhashi^1,2, Koji Horiba², Hiroshi Kumigashira^1,2 (1.Tohoku Univ., 2.KEK-PF)

Keywords:strongly correlated oxide, photoelectron spectroscopy, metal-insulator transition