[20a-C204-1~12] 8.2 Plasma deposition of thin film, plasma etching and surface treatment

[20a-C204-2] Nitriding treatment by Active Screen Plasma and its evaluation

〇(P)Susumu Ichimura¹, Seigo Takashima¹, Ippei Tsuru², Daichi Ohkubo², Hideaki Matsuo², Mineo Goto² (1.PLACIA, 2.NAKANIHON-RO KOGYO)

Keywords:Nitriding treatment, ion milling, Active Screen Plasma

Active Screen Plasma nitridation has been studied by Shimane Prefecture Industrial Technology Center Asahina et al, Kansai University Nishimoto et al. . In order to enhance the superiority of this nitriding method, we measured the radical density of the active screen plasma and nitrided it. In addition, thickness of the compound layer is important as the evaluation item of nitriding, but this time, we report on the precise evaluation method with ion milling and electron microscope established.