2018年第65回応用物理学会春季学術講演会

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10 スピントロニクス・マグネティクス » 10.4 半導体スピントロニクス・超伝導・強相関

[20a-D104-1~11] 10.4 半導体スピントロニクス・超伝導・強相関

2018年3月20日(火) 09:00 〜 12:00 D104 (56-104)

吉野 淳二(東工大)、新屋 ひかり(横国大)

09:00 〜 09:15

[20a-D104-1] Effect of Be Doping on the Electronic Structure of n-Type Ferromagnetic Semiconductor (In,Fe)As

MASAKI KOBAYASHI1,2、HISAO KIUCHI2、HIDEHARU NIWA2、JUN MIYAWAKI3、ATSUSHI FUJIMORI4、LE DUC ANH2、PHAM NAM HAI1,2,5、MASAAKI TANAKA1,2、MASAHARU OSHIMA2、YOSHIHISA HARADA3 (1.CSRN, Univ. of Tokyo、2.Grad. Sch. Eng., Univ. of Tokyo、3.ISSP, Univ. of Tokyo、4.Dep. Phys., Univ. of Tokyo、5.Tokyo Tech.)

キーワード:Ferromagnetic semiconductor, Electronic structure, Resonant inelastic x-ray scattering

n-type ferromagnetic semiconductor (In,Fe)As:Be shows ferromagnetic property depending on carrier concentration, where the Be dopants act as double donor. In this work, to investigate the effects of Be doping on the electronic structure of (In,Fe)As, we have performed resonant inelastic X-ray scattering (RIXS) measurements on (In,Fe)As:Be thin films. There are clear differences of the Fe 3d RIXS spectra between (In,Fe)As thin films with and without Be doping, although the Be concentration proportional to the carrier concentration is of the order of 1019 cm-3. This result suggests that the Be doping not only provides carriers to (In,Fe)As, but also strengthens the hybridization between the Fe 3d and the InAs bands.