[20p-B401-1~12] 7.3 Micro/Nano patterning and fabrication

[20p-B401-12] Investigation of a lift-off process in UV nanoimprint technology for copying of a thin-film-type aluminum power source showing photo-induced voltage

〇HARUNA YANO¹, MASARU NAKAGAWA¹ (1.IMRAM, Tohoku Univ.)

Keywords:lift-off process, UV nanoimprint lithography, metamaterial

Compared with electron beam lithography, UV nanoimprint lithography enables the fabrication of visible wavelength-size structures in large area with high throughput. A lift-off process in UV nanoimprint technology was investigated for copying of a thin-film-type aluminum power source. In the case of a lift-off process based on an additive method using a sacrifice layer, the use of a sacrifice layer to dissolve in acidic or alkaline aqueous solutions is difficult because amphoteric aluminum metal erodes by the aqueous solutions. In this study, the lift-off process with a sacrifice layer to dissolve in solvent was investigated.