The 65h JSAP Spring Meeting, 2018

Presentation information

Poster presentation

15 Crystal Engineering » 15.4 III-V-group nitride crystals

[20p-P6-1~29] 15.4 III-V-group nitride crystals

Tue. Mar 20, 2018 1:30 PM - 3:30 PM P6 (P)

1:30 PM - 3:30 PM

[20p-P6-2] Micro-Photoluminescence Mapping for Surface Plasmon Enhanced Emissions from Aluminum Coated InGaN/GaN QWs

〇(D)Kazutaka Tateishi1, Mitsuru Funato2, Yoichi Kawakami2, Koichi Okamoto1, Kaoru Tamada1 (1.Kyushu Univ. IMCE, 2.Kyoto Univ. Engineering)

Keywords:InGaN/GaN QWs, surface plasmon, Aluminum

We reported the huge photoluminescence enhancement observed with Al coated InGaN/GaN quantum wells(QWs) and that the PL enhancement should be due to excitation efficiency improvement lead by surface plasmon (SP) on thermally deposited aluminum film. In this study, we will present about the effect, which was observed with PL mapping method, from SP on aluminum to the properties of QWs originated from partial In composition fluctuation, such as exciton localization and quantum confined Stark effect