Microlenses fabricated on GaAs substrate

Tatsuya Imaoka; Homare Kambara; Taishi Sasaki; Satoshi Shimomura

Presentation information

Oral presentation

15 Crystal Engineering » 15.3 III-V-group epitaxial crystals, Fundamentals of epitaxy

[18p-B31-1~16] 15.3 III-V-group epitaxial crystals, Fundamentals of epitaxy

Wed. Sep 18, 2019 1:15 PM - 6:00 PM B31 (B31)

Kouichi Akahane(NICT), Sachie Fujikawa(Tokyo Denki University), Nobuaki Kojima(Toyota Tech. Inst.)

5:00 PM - 5:15 PM

[18p-B31-13] Microlenses fabricated on GaAs substrate

〇Tatsuya Imaoka¹, Homare Kambara¹, Taishi Sasaki¹, Satoshi Shimomura¹ (1.Ehime Univ)

Keywords:GaAs, Etching, microlens

With the first etching with a GaAs substrate masked and the second etching performed with the mask removed, we aimed to produce a focusing lens for infrared surface-emitting lasers and LEDs. We found the conditions for preparing the microlens by adjusting the etching time of the phosphoric acid based etchant and demonstrated that it was possible to collect light.