1:30 PM - 3:30 PM
▲ [18p-PB1-28] Investigation of Electrical Spin Injection into GaAs Using Co2Fe0.4Mn0.6Si Heusler Alloy
Keywords:semiconductor, spin injection, Heuslar alloy
The spin-MOSFET is expected to show a high performance in integrated circuits. Highly efficient spin injection into semiconductors from ferromagnet is important for the realization of spin-MOSFET. However, it is difficult to realize efficient spin injection due to the conduction mismatch problem. In order to enhance the efficiency of spin injection, it was proposed to use a half-metal theoretically having a spin polarization of 100%. Co-based full Heusler alloys are expected to be a source of spin injection into semiconductors because of its high Curie temperature, small lattice mismatch with Ⅲ-V semiconductor and high spin polarization. In this study, we focused on Co2Fe0.4Mn0.6Si (CFMS) and aimed to fabricate high quality thin films on GaAs substrates for the realization of high efficiency of spin injection.