[19a-B31-1~5] New development of surface and interface evaluation methods for thin films

[19a-B31-4] Characterization of functional thin film materials by X-ray diffraction techniques

〇Katsuhiko Inaba¹ (1.Rigaku Corp.)

Keywords:X-ray diffraction, functional thin film, Pole Figure measurement

X-ray diffraction (XRD) technique is one of the most important characterization techniques of thin film materials. Various XRD techniques will be explained using results of analysis of modern functional thin film materials, together with cutting edge characterization techniques. (Al-doped ultra thin ZnO films on glass substrate, non-polar epitaxial growth of ZnS/ZnO double-hetero structure on m-plane Sapphire, etc)