[19a-B31-1~5] New development of surface and interface evaluation methods for thin films

[19a-B31-5] The characteristics of microstructure of very thin metal-oxide films deposited on amorphous glass substrates on the basis of X-ray analysis

〇Tetsuya Yamamoto¹, Hisashi Kitami^1,2, Yutaka Furubayashi¹, Junichi Nomoto³ (1.Kochi Univ. Tech., Res. Inst., 2.Sumitomo Heavy Indus. Ltd., 3.AIST)

Keywords:metal-oxide films, X-Ray Reflectivity, film density

In this work, we elucidate the characteristics of microstructure of very thin metal-oxide films such as Ga-doped ZnO and Sn-doped In2O3 films deposited on amorphous glass substrates on the basis of X-ray analysis. The metal-oxide films with thicknesses of less than 10 nm were deposited on reactive plasma deposition with dc arc discharge. The precise control of flow rates of oxygen-molecule gas which is introduced into the chamber during film growth is essential to tailor the adhesion of the films with glass substrates, and to realize the properties to meet the requirements of the applications. We discuss how to achieve the meta-oxide films with interface layers having the unique structural properties.