The 80th JSAP Autumn Meeting 2019

Presentation information

Oral presentation

8 Plasma Electronics » 8.7 Plasma Electronics Invited Talk

[19a-B32-3~3] 8.7 Plasma Electronics Invited Talk

Thu. Sep 19, 2019 10:30 AM - 11:00 AM B32 (B32)

Mineo Hiramatsu(Meijo Univ.)

10:30 AM - 11:00 AM

[19a-B32-3] [INVITED] Progress and future prospects in dry etching technology

Kazuo Nojiri1 (1.Nanotech Research)

Keywords:dry etching, atomic layer etching, smart factory

In this presentation, I will look back on the progress in dry etching technology, from the early stage of plasma source development to the latest atomic layer etching. Then, I will talk about the future prospects of dry etching technology, including the challenges in smart factory for industry 4.0. Finally, I will propose the closer collaboration between academia and industry for further progress.