[19a-E308-1~9] 17.3 Layered materials

[19a-E308-2] Sheet resistance reduction of Sputtered MoS₂ Film by Cl₂ Plasma Treatment

〇Takuya Hamada¹, Taiga Horiguchi¹, Tetsuya Tatsumi², Shigetaka Tomiya², Masaya Hamada¹, Takuya Hoshii¹, Kuniyuki Kakushima¹, Kazuo Tsutsui³, Hitoshi Wakabayashi^1,2 (1.School of Engineering, Tokyo Tech, 2.Research Institute of the Earth Inclusive Sensing, Tokyo tech, 3.IIR, Tokyo tech)

Keywords:transition metal dichalcogenide, MoS2, Cl2 plasma