The 80th JSAP Autumn Meeting 2019

Presentation information

Oral presentation

3 Optics and Photonics » 3.7 Laser processing

[19a-N304-1~10] 3.7 Laser processing

Thu. Sep 19, 2019 9:00 AM - 11:45 AM N304 (N304)

Yoshie Ishikawa(AIST), Masayuki Kakehata(AIST)

9:00 AM - 9:15 AM

[19a-N304-1] A patterning method of Al thin film on polycarbonate by F2 laser irradiation

Tsuyoshi Yoshida1, Nojiri Hidetoshi2, Okoshi Masayuki1 (1.N.D.A., 2.RENIAS CO., LTD.)

Keywords:VUV laser, micro patterning

In recent years, polycarbonate (=PC) is gathering attention as light and strong material for smart windows. In the presentation, a micropatterning method of Al thin film on silicone hard-coated polycarbonate by 157 nm F2 laser irradiation will be reported. A photomask placed on Al thin film on polycarbonate and irradiated by F2 laser and the non-irradiated area was removed by KOH aq. The mechanism of the micropatterning was examined by XPS measurement and it represents that the surface of Al thin film is modified to Al2O3 by F2 laser irradiation. Then, it can be cocluded that the modified Al2O3 surface prevents the chemical etching of KOH aq. In the presentation, the effect of F2 laser irradiation at Al/silicone hard coat interface will be discussed based on ATR-FTIR and XPS spectra of polycarbonate surface under Al thin film.