[19a-N304-1~10] 3.7 Laser processing

[19a-N304-1] A patterning method of Al thin film on polycarbonate by F₂ laser irradiation

〇Tsuyoshi Yoshida¹, Nojiri Hidetoshi², Okoshi Masayuki¹ (1.N.D.A., 2.RENIAS CO., LTD.)

Keywords:VUV laser, micro patterning

In recent years, polycarbonate (=PC) is gathering attention as light and strong material for smart windows. In the presentation, a micropatterning method of Al thin film on silicone hard-coated polycarbonate by 157 nm F₂ laser irradiation will be reported. A photomask placed on Al thin film on polycarbonate and irradiated by F₂ laser and the non-irradiated area was removed by KOH aq. The mechanism of the micropatterning was examined by XPS measurement and it represents that the surface of Al thin film is modified to Al₂O₃ by F₂ laser irradiation. Then, it can be cocluded that the modified Al₂O₃ surface prevents the chemical etching of KOH aq. In the presentation, the effect of F₂ laser irradiation at Al/silicone hard coat interface will be discussed based on ATR-FTIR and XPS spectra of polycarbonate surface under Al thin film.