[19a-PA4-1~14] 16.3 Bulk, thin-film and other silicon-based solar cells

[19a-PA4-7] Effect of post deposition annealing on GaO_x film deposited by mist CVD Method (Ⅱ)

〇Hiroaki Matsuda¹, Hidenobu Mori¹, Koji Arafune¹, Haruhiko Yoshida¹ (1.Univ. of Hyogo)

Keywords:passivation, mist CVD Method, solar cell

H₂ annealing and N₂ annealing were applied on GaO_x film deposited by the mist CVD Method, and the electrical characteristics were evaluated and analyzed by XPS.