[19p-B11-1~8] Interfacial Nano Electrochemistry - Diversification of Semiconductor Wet Process

[19p-B11-1] Recent Trends in Wet Etching of Si and Ge Surfaces: From Passivation to Machining

〇Kenta Arima¹ (1.Osaka Univ.)

Keywords:semiconductor surface, passivation, machining process

Wet etching is one of the most fundamental processes in wet cleaning and microfabrication of semiconductor surfaces. In order to fabricate semiconductor devices with higher performances, the importance of wet etching becomes more significant than that today. And a demanded accuracy is approaching its limit, or the atomic scale. In this talk, I will review our results as well as recent topics of wet etching of Si and Ge surfaces that is closely related to wet cleaning and machining.