The 80th JSAP Autumn Meeting 2019

Presentation information

Oral presentation

3 Optics and Photonics » 3.15 Silicon photonics

[19p-E206-1~19] 3.15 Silicon photonics

Thu. Sep 19, 2019 1:15 PM - 6:45 PM E206 (E206)

Yuya Shoji(Tokyo Tech), Mitsuru Takenaka(Univ. of Tokyo), Nobuhiko Nishiyama(Tokyo Tech)

5:45 PM - 6:00 PM

[19p-E206-16] Investigation of SiNx optical waveguides on bulk Si substrate

〇(M2)Ryota Oyamada1, Yuki Ueno1, Shun Sasaki2, Tetsuya Nakai2, Yasuhiko Ishikawa1 (1.Toyohashi Univ. Tech., 2.SUMCO)

Keywords:optical waveguide, silicon nitride

In Si photonics, SOI (Si-on-insulator) substrate is usually used in the device fabrication. The use of bulk Si substlate, similar to the erectronic circuits, is promissing in terms of the productivity and the cost. So far, SiNx/SiO2/bulk Si structures have been investigated. In this work, sputtered SiNx layer is shown to be applicable to optical waveguides. From the view point of the integration with Ge photodetectors, an investigation is performed to reduce the thickness of SiO2 undercladding layer.