Presentation information

Tweet

Oral presentation

13 Semiconductors » 13.3 Insulator technology

[19p-E305-1~15] 13.3 Insulator technology

Thu. Sep 19, 2019 1:45 PM - 5:45 PM E305 (E305)

Toshifumi Irisawa(AIST), Kiyoteru Kobayashi(Tokai Univ.)

4:00 PM - 4:15 PM

[19p-E305-9] Fabrication of Al₂O₃/GeO₂/Ge structure using Kr/O₂ plasma oxidation method

〇(M2)Takeshi Tokorozuki¹, Yoshitaka Iwazaki¹, Tomo Ueno¹ (1.TAT)

Keywords:germanium