[19p-E311-1~14] 6.3 Oxide electronics

▲ [19p-E311-11] Photo-induced super-hydrophilic anatase thin film fabricated via electrospray deposition from molecular precursor solution onto a quartz glass substrate

〇(D)Natangue Heita Shafudah¹, Hiroki Nagai², Yukihiro Kudoh³, Taiju Takahashi⁴, Mitsunobu Sato⁵ (1.Appl Chem Chem Eng, 2.Appl Phys, 3.Infor and commu Eng, 4.Inform and commu Eng, 5.Apply Phys)

Keywords:Electrospray, Quartz glass, Anatase

Electrospray deposition (ESD) has been used for film fabrication of anatase thin film on a quartz glass substrate. The quartz glass surface was modified before fabrication by an SWCNT ultra-thin film obtained via spin coating 0.005 mass% of SWCNT solution. A molecular precursor solution which involves Ti4+ complex salt of 0.10 mmol per gram was electro-sprayed on the SWCNT pre-coated quartz glass substrates. The precursor film obtained was heat-treated at 500 °C in air for 1 h. The resultant thin films were compared to those fabricated by using a spin-coating procedure. The XRD patterns of all thin films suggest that all the crystals on the quartz glass substrate are assignable to anatase. The film thicknesses of the ESD thin film and spin coated films are 90 and 100 nm, respectively. All the thin films are transparent and exhibit optical transmittance over 85% in the visible region. The optical band gap of the ESD and spin-coated thin films calculated from Tauc plot equation is 3.62 and 3.64 eV, respectively, while their refractive index is 2.15 and 2.07 respectively, as a reference to the quartz glass substrate. Water contact angle measurements of the thin film were investigated and a photoinduced super-hydrophilic anatase thin film of 90 nm thickness could be obtained by heat treatment of the precursor film at 500 °C in air for 1 h.