[19p-E313-1~9] 15.5 Group IV crystals and alloys

△ [19p-E313-2] Evaluation of Local Structure of SiGe Thin Film on Si Substrate at Low Temperature using XAFS Measurement

〇Kazutoshi Yoshioka¹, Ryo Yokogawa^1,2, Yuki Takahashi¹, Haruki Takeuchi¹, Ichiro Hirosawa³, Takeshi Watanabe³, Atsushi Ogura¹ (1.Meiji Univ., 2.JSPS Research Fellow DC, 3.JASRI)

Keywords:SiGe, XAFS