[19p-E313-1~9] 15.5 Group IV crystals and alloys

△ [19p-E313-3] Depth-resolved nanobeam X-ray diffraction analysis on a high-Ge-content SiGe film with a compositionally graded layer on a Si substrate

〇Kazuki Shida¹, Tetsuya Tohei¹, Yusuke Hayashi¹, Kazushi Sumitani², Yasuhiko Imai², Shigeru Kimura², Akira Sakai¹ (1.Osaka Univ., 2.JASRI)

Keywords:nanobeam X-ray diffraction, SiGe, compositionally graded layer