[20a-PA4-1~14] 8.2 Plasma deposition of thin film, plasma etching and surface treatment

[20a-PA4-6] Low temperature synthesis of Al₂O₃ thin film by low energy electron and oxygen radical irradiation on Al(CH₃)₃ condensed layer

〇(M1)Atsuki Okawa¹, Daichi Yamada², Yohei Otani², Tetsuya Sato¹ (1.Univ. of Yamanashi, 2.Tokyo Univ. of Science, Suwa)

Keywords:metal oxide film