2019年第80回応用物理学会秋季学術講演会

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一般セッション(口頭講演)

合同セッションK「ワイドギャップ酸化物半導体材料・デバイス」 » 21.1 合同セッションK 「ワイドギャップ酸化物半導体材料・デバイス」

[20p-B31-1~17] 21.1 合同セッションK 「ワイドギャップ酸化物半導体材料・デバイス」

2019年9月20日(金) 13:45 〜 18:30 B31 (B31)

大島 孝仁(FLOSFIA)、藤原 宏平(東北大)、宇野 和行(和歌山大)

14:30 〜 14:45

[20p-B31-4] Investigation of transport property reductions in epitaxial La-doped BaSnO3 films

HaiJun Cho1、Bin Feng2、Takaki Onozato1、Mian Wei1、Anup Sanchela1、Yuichi Ikuhara2、Hiromichi Ohta1 (1.Hokkaido Univ.、2.Univ. of Tokyo)

キーワード:Transparent oxide semiconductor, Transport properties, Electron microscopy

La-doped BaSnO3 (LBSO) exhibits a wide bandgap (~3.5 eV) and high single crystal electron mobility (320 cm2 V1 s1) at high electron density, which are ideal transparent oxide semiconductor characteristics for optoelectronic applications. However, the mobility observed from LBSO thin films is much lower compared to the single crystal value. Most studies attribute this phenomenon to the threading dislocations from the lattice mismatch between LBSO/substrate, but the threading dislocations do not fully explain the mobility suppression in LBSO films. In this work, we discuss different factors dominating the mobility of LBSO films and the limitations in aiming the single crystal mobility in LBSO films.