[20p-N304-1~10] Latest trend on atomic layer processes

[20p-N304-1] Challenges for ALD process development and expectations for data science

〇Yukihiro Shimogaki¹ (1.The Univ. Tokyo)

Keywords:Thin Film Fabrication, Atomic Layer Deposition

The ALD process is a film forming method excellent in controllability and reproducibility of film thickness and excellent in step coverage. Although many application developments have been made in anticipation of this, there is a lot of missing information for optimum process design. In this regard, the expectation for data science that uses quantum chemical calculations and experimental data successfully is stated.