The 80th JSAP Autumn Meeting 2019

Presentation information

Symposium (Oral)

Symposium (technical) » Latest trend on atomic layer processes

[20p-N304-1~10] Latest trend on atomic layer processes

Fri. Sep 20, 2019 1:30 PM - 5:45 PM N304 (N304)

Makoto Sekine(Nagoya Univ.), Takeshi Momose(Univ. of Tokyo), Kazuhiro Karahashi(Osaka univ.)

2:00 PM - 2:30 PM

[20p-N304-2] How the materials informatics can be applied to ALD and ALE

Toyohiro Chikyo1, Hiori Kino1 (1.NIMS)

Keywords:Informatics, ALD, ALE

We will examine whether the data science methods can be applied to ALD and ALE. The precursors are considerable predicted by automatic calculation using first principle calculation. The surface decomposition process can be speculated by machine learning at a certain temperature and non polar amorphous SiO2/Si (100) surface. Especially if we can find the proper descriptors for decomposition, rather fast calculation will be possible and we can compare the virtual process and real one simultaneously.iIn the lecture day, I will outline the current situation in materials informatics and mention the possibility of application to ALE and ALD.