The 80th JSAP Autumn Meeting 2019

Presentation information

Symposium (Oral)

Symposium (technical) » Latest trend on atomic layer processes

[20p-N304-1~10] Latest trend on atomic layer processes

Fri. Sep 20, 2019 1:30 PM - 5:45 PM N304 (N304)

Makoto Sekine(Nagoya Univ.), Takeshi Momose(Univ. of Tokyo), Kazuhiro Karahashi(Osaka univ.)

3:00 PM - 3:30 PM

[20p-N304-4] RT atomic layer deposition and its application to gas barrier

Kensaku Kanomata2, Masanori Miura2, 〇Fumihiko Hirose1 (1.Yamagata Univ., 2.ROEL, Yamagata Univ.)

Keywords:atomic layer deposition, room temperature, gas barrier

RT atomic layer depostion was developed and its application to gas barrier is explained in the conference. In the development, in situ obsevation of surface reaction was performed to illucidate the rate-limiting reaction. The plasma system was also devloped base on the obseravation. In the conference, experimental results of Al2O3 and SiO2 ALDs are released. Application to gas barrier is also demonstrated.