Surface Reaction Analyses for Atomic Scale Processing by Beam Experiments

Presentation information

Symposium (Oral)

Symposium (technical) » Latest trend on atomic layer processes

Fri. Sep 20, 2019 1:30 PM - 5:45 PM N304 (N304)

Makoto Sekine(Nagoya Univ.), Takeshi Momose(Univ. of Tokyo), Kazuhiro Karahashi(Osaka univ.)

3:45 PM - 4:15 PM

〇Kazuhiro Karahashi¹, Tomoko Ito¹, Satoshi Hamaguchi¹ (1.osaka univ.)

Keywords:atomic layer etching, atomic layer deposition, molecular beam