The 80th JSAP Autumn Meeting 2019

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Symposium (Oral)

Symposium (technical) » Latest trend on atomic layer processes

[20p-N304-1~10] Latest trend on atomic layer processes

Fri. Sep 20, 2019 1:30 PM - 5:45 PM N304 (N304)

Makoto Sekine(Nagoya Univ.), Takeshi Momose(Univ. of Tokyo), Kazuhiro Karahashi(Osaka univ.)

4:15 PM - 4:30 PM

[20p-N304-6] Atomic Layer Etching of Ni by Ar-GCIB irradiation on acac adsorbed surface

〇(M1)Kota Uematsu1, Noriaki Toyoda1 (1.Univ. of Hyogo)

Keywords:Gas cluster ion beam, Atomic layer etching