The 80th JSAP Autumn Meeting 2019

Presentation information

Oral presentation

Joint Session K » 21.1 Joint Session K "Wide bandgap oxide semiconductor materials and devices"

[21a-B31-1~8] 21.1 Joint Session K "Wide bandgap oxide semiconductor materials and devices"

Sat. Sep 21, 2019 9:00 AM - 11:15 AM B31 (B31)

Tomoki Abe(Tottori Univ.)

10:30 AM - 10:45 AM

[21a-B31-6] In-situ observation of crystallization of amorphous Sn-doped In2O3 films

Yutaka Furubayashi1, Shintaro Kobayashi2, Makoto Maehara3, Hisashi Kitami1,3, Toshiyuki Sakemi3, Katsuhiko Inaba2, Tetsuya Yamamoto1 (1.Kochi Univ. Tech., 2.Rigaku Corp., 3.Sumitomo Heavy Industries, Ltd.)

Keywords:Indium oxide, Amorphous film, Crystalization

Thermally-crystalized amorphous In2O3 (a-IO) films have a large mobility. Therefore, they have been applied to solar cells. Although there are many reports on a crystalization of a-IO, few research have focused on a growth condition with the same composition. In this study, we investigated in-situ X-ray observation by using a two-dimensional ditector, in order to elucidate a dynamics of the crystalization of amorphous Tin-doped In2O3 (ITO) films grown under various conditions by using the same ITO target.