The 80th JSAP Autumn Meeting 2019

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6 Thin Films and Surfaces » 6.4 Thin films and New materials

[21a-C310-1~12] 6.4 Thin films and New materials

Sat. Sep 21, 2019 9:00 AM - 12:15 PM C310 (C310)

Hiroaki Nishikawa(Kindai Univ.)

11:30 AM - 11:45 AM

[21a-C310-10] Influence of the film thickness on the spinodal decomposition in (Ti,V)O2/TiO2(100)

〇Takahiro Fukuda1, Takayoshi Yokoya2, Yuji Muraoka2 (1.Okayama Univ., 2.Okayama Univ. RIIS.)

Keywords:(Ti,V)O2 film, supinodal decomposition, film thickness

Ti0.2V0.8O2 films grown on TiO2(100) substrates was fabricated. The film thickness was varied from 240 nm down to 5 nm and the influence of the film thickness on the spinodal decomposition was studied. The c axis length of the films depend the film thickness changes, and is expanded more in thinner films. After annealing the thin film, the spinodal decomposition did not occur. We will explain the results in terms of the degrees of the strain of c axis length in TiVO2 films.