The 80th JSAP Autumn Meeting 2019

Presentation information

Oral presentation

13 Semiconductors » 13.7 Compound and power electron devices and process technology

[21a-E301-1~13] 13.7 Compound and power electron devices and process technology

Sat. Sep 21, 2019 9:00 AM - 12:30 PM E301 (E301)

Kozo Makiyama(Fujitsu Lab.)

10:15 AM - 10:30 AM

[21a-E301-6] n-type AlN MESMETs using graded AlGaN contact layers

Masanobu Hiroki1, Kazuhide Kumakura1 (1.NTT BRL)

Keywords:AlN, MESFET

Recently, we improved the contact characteristics of n-AlN by forming a graded AlGaN contact layer and obtained good Ohmic characteristics. In this study, we fabricated n-AlN MESFETs using the graded AlGaN contact layer. The maximum drain current at Vgs = 2 V and Vds = 20 V was 420 uA/mm. The off-state breakdown voltage (Vb) was 280 V when the distance between the gate and drain electrodes (Lgd) was 1 um. Vb increased with increasing Lgd. Vb of 1680 V was obtained for Lgd = 11 um.