2019年第66回応用物理学会春季学術講演会

講演情報

一般セッション(口頭講演)

8 プラズマエレクトロニクス » 8.6 Plasma Electronics English Session

[10a-M103-1~7] 8.6 Plasma Electronics English Session

2019年3月10日(日) 09:00 〜 10:45 M103 (H103)

松浦 寛人(阪府大)

09:15 〜 09:30

[10a-M103-2] Oxygen Radical Measurement of Atmospheric Pressure Microwave Line Plasma by Vacuum Ultraviolet Absorption Spectroscopy

〇(M2)Hansin BAE1、Koike Yosuke1、Hirotsugu Koma1、Haruka Suzuki1、Seigo Takashima3、Hirotaka Toyoda1,2 (1.Nagoya Univ.、2.PLANT, Nagoya Univ.、3.Industries Promotion Corporation, Nagoya)

キーワード:O radical diagnostic, Atmospheric pressure plasma

We have developed atmospheric pressure microwave line plasma (APMLP) source of ~1 m in length. In this study, O radical density of APMLP is measured by vacuum ultra violet absorption spectroscopy (VUVAS) and O2 gas flow rate dependence of O radical density is measured. Furthermore, spatial dependences of O radical density along the long plasma is measured.