[10a-M103-1~7] 8.6 Plasma Electronics English Session

▼ [10a-M103-4] Deposition Control of Carbon Nanoparticles Synthesized Using Ar + CH₄ Multi-Hollow Discharges

〇SungHwa Hwang¹, Kunihiro Kamataki¹, Naho Itagaki¹, Kazunori Koga¹, Masaharu Shiratani¹ (1.Kyushu Univ. for Kyushu University)

Keywords:multi-hollow discharge plasma chemical vapor deposition, Carbon nanoparticles

Carbon nanoparticles (CNPs) are regarded as one of the central materials in nanotechnology. In this study, we have applied Ar + CH₄ multi-hollow discharge plasma chemical vapor deposition (MHDPCVD) process to synthesis of CNPs and their deposition on substrates. The produced particle size was nearly the same in a range between 5 and 30 nm. However, nonlinear deposition rate indicates that the deposition mechanism is not simple.