[10a-M112-1~6] 2.3 Application, radiation generators, new technology

[10a-M112-3] Improvement of mirror shape in MEMS X-ray optics usnig chemical mechanical polishing

〇Aoto Fukushima¹, Maiko Fujitani¹, Kumi Ishikawa², Masaki Numazawa¹, Daiki Ishi¹, Ryota Otsubo¹, Hikaru Suzuki¹, Hikaru Nagatoshi¹, Tatsuya Yuasa¹, Takaya Ohashi¹, Kazuhisa Mitsuda², Yuichiro Ezoe¹ (1.TMU, 2.ISAS)

Keywords:CMP, X-ray optics, DRIE

We have been developing space X-ray optics based on MEMS technologies. Micropore structures are formed in a silicon wafer with deep reactive ion etching (DRIE). Sidewalls of the micropores are used for X-ray mirrors. From the past development, burrs were seen at each sidewall after DRIE process. These structures can shade a part of incident and reflected X-rays leading to decrease in the effective area. Therefore, we have introduced chemical mechanical polishing process to remove burrs. We will report the fabrication including this new process and improvement of our optics.