2019年第66回応用物理学会春季学術講演会

講演情報

一般セッション(口頭講演)

コードシェアセッション » 【CS.7】7.4 量子ビーム界面構造計測、9.5 新機能材料・新物性のコードシェアセッション

[10a-S423-1~11] CS.7 7.4 量子ビーム界面構造計測、9.5 新機能材料・新物性のコードシェアセッション

2019年3月10日(日) 09:00 〜 12:00 S423 (S423)

清水 智弘(関西大)、白澤 徹郎(産総研)

11:45 〜 12:00

[10a-S423-11] X-ray Standing Wave Imaging and Its Application in Langmuir-Blodgett Films

〇(D)Wenyang Zhao1,2、Kenji Sakurai2,1 (1.Tsukuba Univ.、2.NIMS)

キーワード:X-ray standing wave, Imaging, Nanolayers

The present talk describes a powerful extension of the X-ray standing wave (XSW) technique that combines it with the capability of full-field X-ray fluorescence imaging, so that the impurity depth profiles at all different parts of a nanolayer material can be measured in parallel. The imaging capability improves the robustness and reliability of the XSW technique in investigating inhomogeneous 2D materials and soft interfaces. It can also visualize the 3D element-specific structure at a buried interface with a depth resolution at the nanometer level. The in-plane spatial resolution is 160 μm or better, which is capable to resolve the macroscopic in-plane inhomogeneity in many large-size nanolayer materials. So far, the present technique has been successfully applied to investigate the distribution of iron impurities in a Ni/C periodic multilayer. It is also able to probe the depth profile and in-plane uniformity of functional groups in Langmuir-Blodgett films.