14:30 〜 14:45
▲ [10p-W321-6] Effect of Annealing Temperature in H2S-free Sulfurization Method for CIS Fabrication
キーワード:CIS solar cell, Sulfurization
The effect of annealing temperature in sulfurization process to fabricate CIS was investigated. The CIS was formed through reaction between sulphur and a precursor Cu-In layer. The annealing temperature was varied between from 300°C to 600°C. The samples were evaluated through XRD, SEM, and EDS measurements. Peaks of CuInS2 were found in the XRD results with increase of intensity on higher annealing temperature. Cu2-xS was also found in the samples, suspected to form during the cooling process following annealing.The effect of the annealing temperature on the film adhesiveness was also investigated. Although sulfur and the precursor reacted better in higher temperature, the film adhesiveness decreased for each temperature increment.