2019年第66回応用物理学会春季学術講演会

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一般セッション(口頭講演)

13 半導体 » 13.9 化合物太陽電池

[10p-W321-1~16] 13.9 化合物太陽電池

2019年3月10日(日) 13:15 〜 17:30 W321 (W321)

石塚 尚吾(産総研)、宮崎 尚(防衛大)

14:30 〜 14:45

[10p-W321-6] Effect of Annealing Temperature in H2S-free Sulfurization Method for CIS Fabrication

〇(M1)Dwinanri Egyna1、Kazuyoshi Nakada1、Akira Yamada1 (1.Tokyo Tech)

キーワード:CIS solar cell, Sulfurization

The effect of annealing temperature in sulfurization process to fabricate CIS was investigated. The CIS was formed through reaction between sulphur and a precursor Cu-In layer. The annealing temperature was varied between from 300°C to 600°C. The samples were evaluated through XRD, SEM, and EDS measurements. Peaks of CuInS2 were found in the XRD results with increase of intensity on higher annealing temperature. Cu2-xS was also found in the samples, suspected to form during the cooling process following annealing.The effect of the annealing temperature on the film adhesiveness was also investigated. Although sulfur and the precursor reacted better in higher temperature, the film adhesiveness decreased for each temperature increment.