2019年第66回応用物理学会春季学術講演会

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6 薄膜・表面 » 6.4 薄膜新材料

[10p-W323-1~16] 6.4 薄膜新材料

2019年3月10日(日) 13:45 〜 18:15 W323 (W323)

西川 博昭(近畿大)、大友 明(東工大)

18:00 〜 18:15

[10p-W323-16] Buffer layers dependence of magnetic properties for C38-type MnGaGe films

〇(DC)Mingling Sun1,2、Takahide Kubota2,3、Yoshiaki Kawato4、Shigeki Takahashi4、Yoshiaki Sonobe4、Koki Takanashi2,3 (1.Grad. Sch. of Eng, Tohoku Univ.、2.IMR, Tohoku Univ.、3.CSRN, Tohoku Univ.、4.Samsung R&D Institute Japan)

キーワード:uniaxial magnetic anisotropy

We are focusing on C38-type MnGaGe ordered alloy films. In our previous work, epitaxially grown Mn33Ga36Ge31 films which are close to the stoichiometry were deposited on MgO (100) substrates directly. The maximum value of Ku was ~ 8 × 106 erg/cm3 in the sample with a 100-nm-thick Mn33Ga36Ge31 layer annealed at 500 ºC [2]. In addition, perpendicular magnetization was achieved for the thickness of Mn33Ga36Ge31 layer down to 10 nm. However, the squareness of the magnetization curves was poor, which was probably because of relatively large orientation dispersion. In this presentation, we will report the latest progress of optimization of Mn33Ga36Ge31 films with various buffer layers.
The stacking structures of this work was MgO (001) substrate/buffer layer(s)/ Mn33Ga36Ge31 (t)/MgO 2 nm/Ta 5 nm. t was varied from 100 nm to 5 nm. All the metallic layers were deposited by using an ultrahigh-vacuum magnetron sputtering system, and the MgO layer was deposited by using an electron beam evaporation system. The samples using Cr buffer layer exhibited perpendicular magnetization down to t of 50 nm. Although XRD profiles exhibited a relatively high degree of (001) orientation, diffractions from (110) planes also remained for the out-of-plane measurements of the Cr buffer samples. Samples using other buffer layers will be discussed in the presentation.