The 66th JSAP Spring Meeting, 2019

Presentation information

Oral presentation

6 Thin Films and Surfaces » 6.4 Thin films and New materials

[10p-W323-1~16] 6.4 Thin films and New materials

Sun. Mar 10, 2019 1:45 PM - 6:15 PM W323 (W323)

Hiroaki Nishikawa(Kindai Univ.), Akira Ohtomo(Tokyo Tech)

2:30 PM - 2:45 PM

[10p-W323-3] Synthesis of MoS2 nanotubes by CVD with turbulent flow

〇(B)Manami Goto1, Takashi Yanase2, Taro Nagahama2, Toshihiro Shimada2 (1.Hokkaido Univ., 2.Hokkaido Univ.*)

Keywords:MoS2, CVD, nanotube

Molybdenum disulfide (MoS2) is one of the well-known two-dimensional (2D) materials. Because of the tube shape, MoS2 nanotube (NT) is expected to be used for high-performance application in semiconductor and catalyst, etc. Chemical Vapor Deposition (CVD) is a concise and efficient way to synthesize MoS2 NT. Our laboratory has succeeded to synthesize MoS2 NT using CVD with FeO nanoparticle as a catalyst.
In this study, we tried to explore an easier way to synthesize MoS2 NT by CVD with turbulent flow. Synthesized MoS2 NT is a zig zag type and we can confirm the hollow structure in the nanotube by cross sectional TEM image. In this method, we do not need catalysts and separation of MoS2 NT from the catalyst.