2019年第66回応用物理学会春季学術講演会

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6 薄膜・表面 » 6.3 酸化物エレクトロニクス

[11a-W641-1~10] 6.3 酸化物エレクトロニクス

2019年3月11日(月) 09:00 〜 11:45 W641 (W641)

島 久(産総研)、橘田 晃宜(産総研)

09:30 〜 09:45

[11a-W641-3] Fabrication of p-type CoGa2O4 thin film and its photoelectrochemical properties

〇(M1)Jiaxin Chen1、Hang Zhou1、Munetoshi Seki1、Hitoshi Tabata1 (1.University of Tokyo)

キーワード:p-type semiconductor, photoelectrochemical

The photoelectrical properties of transition metal oxide have a lot of applications such as solar cells and water splitting by sunlight. So far, a number of studies have been done on the photoelectrochemical properties of n-type oxide semiconductors like Fe2O3 and TiO2 for the application to the solar water splitting because of their good stability in water and high responsiveness to visible light. On the contrary, the photoelectrochemical properties of p-type semiconductor materials are not reported a lot because they are unstable and sensible to photocorrosion.
In this study, we focused on a p-type semiconductor oxide CoGa2O4 (CGO). Thin films of CGO were fabricated using a pulsed laser deposition (PLD) technique.