[11p-PB3-1~27] 13.7 化合物及びパワー電子デバイス・プロセス技術

▲ [11p-PB3-3] Study on HCl-based Wet Chemical Cleaning of Epitaxial GaN(0001) Surfaces

〇(M2)Yue Xu¹、Akio Ohta¹、Noriyuki Taoka²、Mitsuhisa Ikeda¹、Katsunori Makihara¹、Tetsuo Narita³、Daigo Kikuta³、Koji Shiozaki¹、Tetsu Kachi¹、Seiichi Miyazaki¹ (1.Nagoya Univ、2.AIST GaN-OIL、3.Toyota Central R&D Labs)

キーワード：wet chemical cleaning, GaN