The 66th JSAP Spring Meeting, 2019

Presentation information

Oral presentation

15 Crystal Engineering » 15.3 III-V-group epitaxial crystals, Fundamentals of epitaxy

[11p-S422-1~10] 15.3 III-V-group epitaxial crystals, Fundamentals of epitaxy

Mon. Mar 11, 2019 1:45 PM - 5:00 PM S422 (S422)

Hidetoshi Suzuki(Miyazaki Univ.), Kou Matsumoto(Taiyo Nippon Sanso)

4:45 PM - 5:00 PM

[11p-S422-10] Below-Bandgap Photoluminescence Emission from SI GaAs substrates subjected to pre-MBE-growth annealing

〇(P)Ronel Intal Roca1, Hiroto Mizuno1, Mikihito Suzuki1, Itaru Kamiya1 (1.Toyota Technological Inst.)

Keywords:GaAs, MBE, annealing

We report the observation of below-GaAs-bandgap photoluminescence (PL) emission from GaAs substrates subjected to thermal annealing during the standard pre-MBE-growth processes. Using below-bandgap excitation as well as backside PL measurements, defects deep within the substrates were probed. A broad PL emission peak at 1000 nm appear after pre-bake annealing at 300° and further defects at 905 and 1150 nm appear after oxide desorption annealing at 600°. These findings confirm the presence of optically-active defects in pre-MBE-growth annealed GaAs substrates.