2019年第66回応用物理学会春季学術講演会

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一般セッション(口頭講演)

3 光・フォトニクス » 3.13 半導体光デバイス

[11p-W611-1~12] 3.13 半導体光デバイス

2019年3月11日(月) 13:45 〜 17:00 W611 (W611)

荒川 太郎(横国大)、内田 史朗(千葉工大)

16:45 〜 17:00

[11p-W611-12] Mid-infrared GeSn Resonant-cavity-enhanced GeSn Photodetectors

〇(M1)CHENG-HSUN TSAI1、Bo-Jun Huang1、Guo-En Chang1 (1.Nat. Chung Cheng Univ.)

キーワード:GeSn, Photodetector, Resonant cavity

GeSn material system has been considered as a promising candidate for efficient mid-infrared (MIR) photodetectors (PDs) on silicon due to its narrow bandgap and CMOS-compatibility for a wide range of applications. Despite the low equilibrium solid solubility of Sn in Ge, significant progress has been made to grow high-quality, high Sn content GeSn layers on silicon using low-temperature growth techniques. Different types of GeSn-based PDs have also been demonstrated with extended optical responses reaching MIR spectral region. However, the responsivity is still limited. Here we present an investigation of MIR resonant-cavity-enhanced GeSn PDs on silicon-on-insulator (SOI) substrates. We show that the photodetection region can be extened to MIR region by Sn-alloying and the responsiivty can be considerably enahnced by the resonant cavity effect.