2019年第66回応用物理学会春季学術講演会

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13 半導体 » 13.2 探索的材料物性・基礎物性

[11p-W834-1~18] 13.2 探索的材料物性・基礎物性

2019年3月11日(月) 13:15 〜 18:30 W834 (W834)

末益 崇(筑波大)、立岡 浩一(静大)、山口 憲司(量研機構)、原 康祐(山梨大)

18:00 〜 18:15

[11p-W834-17] Significant photoresponsivity enhancement of BaSi2 epitaxial films by atomic hydrogen passivation

〇(D)Zhihao Xu1、Tianguo Deng1、Kaoru Toko1、Dmitri Migas2、Takashi Suemasu1 (1.Univ. Tsukuba、2.Belarusian State Univ.)

キーワード:BaSi2, Hydrogen passivation

Semiconducting material BaSi2 has many advantages for the solar cell application, such as a suitable band gap of 1.3 eV, a large absorption coefficient of 3 × 104 cm-1 at 1.5 eV, and a large minority-carrier diffusion length of ca. 10 μm [1]. The first-principle calculation predicts Si vacancies to be most likely to occur as point defects in BaSi2 regardless of Si-rich or Si poor growth condition and lead to the degradation of the minority-carrier properties of BaSi2[2]. Hence, it is important to make those active defects inactive in the bulk region of BaSi2 films. In this study, we investigate the effect of atomic H supply on the photoresponsivity of BaSi2 films and calculate the density of states (DOS) of BaSi2 having one Si vacancy and with H passivation.