The 66th JSAP Spring Meeting, 2019

Presentation information

Poster presentation

21 Joint Session K "Wide bandgap oxide semiconductor materials and devices" » 21.1 Joint Session K "Wide bandgap oxide semiconductor materials and devices"

[12a-PA3-1~26] 21.1 Joint Session K "Wide bandgap oxide semiconductor materials and devices"

Tue. Mar 12, 2019 9:30 AM - 11:30 AM PA3 (PA)

9:30 AM - 11:30 AM

[12a-PA3-4] Characterization of amorphous Al2O3 thin films prepared by mist-CVD

〇(M1)Kazuki Nishimura1, Koshi Nishiyama1, Yuki Fujimoto2, Zenji Yatabe3, Yusui Nakamura4,5 (1.GSST, Kumamoto Univ., 2.Sch. of Eng., Kumamoto Univ., 3.POIE, Kumamoto Univ., 4.FAST, Kumamoto Univ., 5.Kumamoto Phoenics)

Keywords:mist-CVD, Al2O3