2019年第66回応用物理学会春季学術講演会

講演情報

一般セッション(口頭講演)

3 光・フォトニクス » 3.12 ナノ領域光科学・近接場光学

[9a-W621-1~12] 3.12 ナノ領域光科学・近接場光学

2019年3月9日(土) 09:00 〜 12:15 W621 (W621)

石井 智(物材機構)、八井 崇(東京大学)

09:00 〜 09:15

[9a-W621-1] Plasmon-induced Photocurrent Generation on Ga2O3 Loaded with Gold Nanoparticles

〇(D)Yaguang Wang1、Xu Shi1、Tomoya Oshikiri1、Kosei Ueno1、Hiroaki Misawa1,2 (1.RIES-Hokkaido Univ.、2.National Chiao Tung Univ.)

キーワード:Localized surface plasmon resonance, Interface Modification, Gallium oxide

Ga2O3 is a promising photocatalyst with the more negative conduction band compared with commonly used TiO2 due to its much more negative conduction band position which is beneficial to improving efficient water splitting. In this work, the size effect of Au-NPs and the effect of interface modification on the performance of the plasmonic Ga2O3 photoelectrode are investigated.
Different sizes of Au-NPs were obtained from Au film with various thicknesses deposited onto Ga2O3 upon annealing process (Au-NPs/Ga2O3). The samples with Au-NPs size of 13 nm showed the best photocurrent measured under the conventional three-electrode photoelectrochemical measurement system.
To further improve the oxidation process in the water splitting, a thin TiO2 layer with several nanometers was deposited on the Au-NPs/Ga2O3. The IPCE and absorption of the Au-NPs/Ga2O3 system showed an increment compared with samples without the interface modification. Also, the onset potential shifted to positive with modification by TiO2 on Au-NPs/Ga2O3, indicating the positive shift of the flat-band potential of the photoelectrode.