[9a-W631-1~12] 3.7 Laser processing

[9a-W631-1] Formation process of nanostructures on SiO_x with femtosecond laser pulses

〇Godai Miyaji¹, Tatsutoshi Takaya¹, Juergen Ihlemann² (1.Tokyo Univ. of A. & T., 2.Laser-Lab. Gottingen)

Keywords:femtosecond-laser ablation, nanostructure formation

100-fs, 800-nm laser pulses of 500 pulses at 750 mJ/cm² can form nanostructures on SiO_x (x ~ 1) with a period of 220–300 nm in a whole of the irradiation area. The result shows that the high-density electrons are generated in the surface by larger nonlinear optical absorption than that of SiO₂, and near-fields of surface plasmon polaritons induce nanoablation in the surface.