WENHSIN CHANG

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Speaker, Author, Co-Author

Fri. Sep 11, 2020 8:30 AM - 11:45 AM Z09

Oral presentation
| 13 Semiconductors
| 13.5 Semiconductor devices/ Interconnect/ Integration technologies

[11a-Z09-1~12] 13.5 Semiconductor devices/ Interconnect/ Integration technologies

9:15 AM - 9:30 AM

[11a-Z09-4] Improvement of Ge MOS interfacial quality through HI plasma treatment

〇WENHSIN CHANG¹, Toshifumi Irisawa¹, Hiroyuki Ishii¹, Tatsuro Maeda¹ (1.AIST)