Takashi Fukatani

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Speaker, Author, Co-Author

Thu. Sep 10, 2020 12:30 PM - 6:00 PM Z09

Oral presentation
| 13 Semiconductors
| 13.1 Fundamental properties, surface and interface, and simulations of Si related materials

[10p-Z09-1~20] 13.1 Fundamental properties, surface and interface, and simulations of Si related materials

1:15 PM - 1:30 PM

[10p-Z09-4] Elucidation of saw marks flattening mechanism in Si etching using HF/HNO₃ (2)

〇Takashi Fukatani¹, Kenji Takeo¹, Yasuhiro Shikahama¹, Kenya Nishio¹, Tomoki Hirano¹, Suguru Saito¹, Yoshiya Hagimoto¹, Hayato Iwamoto¹ (1.Sony Semiconductor Solutions)

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